In this work, to improve the timing yield of Tunnel Field Effect Transistor (TFET) circuits in the presence of process variations as well as their soft-error resiliency, we propose replacing some of TFET-based gates by MOSFET-based ones. The effectiveness of the proposed TFET-MOSFET hybrid implementation of the circuits are investigated by first studying the impacts of the process variation on the performances (I-V characteristics) of both homojunction InAs TFETs and MOSFETs. Next, to analyze the soft error rate of the circuits, the particle hit-induced transient current profiles of these devices are extracted. Based on these studies, a hybrid TFET-MOSFET circuit design approach which improves the reliability and soft-error resiliency compared to those of pure TFET-based circuits is suggested. Finally, the efficacy of the design approach is investigated by applying it to some circuits of ISCAS’89 benchmark package.